Point defect interaction with dislocations in silicon
نویسندگان
چکیده
We investigated the interaction of intrinsic point defects (vacancies and self-interstitials) with a partial dislocation in silicon. Using a combination of zero-temperature ab initio total energy calculations with finite temperature free-energy calculations based on an interatomic potential, we obtained energies for the relevant core defects. The formation energies of vacancies and interstitials in the core of a 30◦ glide partial dislocation are considerably lower (by more than 1 eV) than in the bulk. However, even at high temperatures, the predicted thermal concentration of shuffle segments, comprised of a row of vacancies or interstitials in the core, is low. Therefore, in the competition between two alternative positions (shuffle or glide {1 1 1} plane sub-sets) for the core of a 30◦ partial dislocation, the glide segment is strongly favored. © 2001 Elsevier Science B.V. All rights reserved. PACS: 61.72.Lk; 61.72.Nn; 61.72.Bb; 62.20.Fe
منابع مشابه
Extended Point Defect Structures at Intersections of Screw Dislocations in Si: A Molecular Dynamics Study
Molecular dynamics computer simulations have been employed with the Tersoff interatomic potential to examine the atomic structure of (a=2) h110i screw dislocations forming regular two-dimensional arrays in silicon. The main attention is focused on the atomic configurations of dislocation intersections. The dislocations are assumed to be undissociated, following HREM observations on the low-angl...
متن کاملComputing Diffusion Coefficients of Intrinsic Point Defects in Crystalline Silicon
The quality of crystalline silicon highly influences the quality of semiconductor devices fabricated with it. Grown-in defects, such as octahedral voids or networks of large dislocation loops can be detrimental to the functionality of devices. Both type of defects result from the interaction of intrinsic point defects, vacancies and self-interstitials during growth and subsequent annealing of t...
متن کاملEvolution of Dislocation Loops in Silicon in an Inert Ambient-ii
A plan-view TEM study of the distribution, geometry and time-dependent anneal behavior of type-11 dislocation loops induced by I x 10’5/cm2, 50 keV Si+ implantation into silicon was presented in Part I of this paper. A point-defect based model representing loop-to-loop interactions (Ostwald-ripening) during annealing is developed. The variation in the size and distribution of the loops as a fun...
متن کاملInteratomic potential for silicon defects and disordered phases
We develop an empirical potential for silicon which represents a considerable improvement over existing models in describing local bonding for bulk defects and disordered phases. The model consists of twoand three-body interactions with theoretically motivated functional forms that capture chemical and physical trends as explained in a companion paper. The numerical parameters in the functional...
متن کاملA study of point defect detectors created by Si and Ge implantation
Short-time/low-temperature thermal oxidation is known to lead to point defect perturbations in silicon. This study investigates the interaction between oxidation-induced point defects and type II dislocation loops intentionally introduced in silicon via ion implantation. The type II (end-of-range) dislocation loops were introduced via implantation of either Sif ions at 50 keV or Ge+ ions at 100...
متن کامل